Both inductively coupled plasma optical emission spectrometry (ICP-OES) and energy dispersive X-ray fluorescence (XRF) technologies have seen dramatic improvements in recent years. Two recently upgraded SPECTRO flagship instruments showcase these advances: the SPECTRO ARCOS ICP-OES analyzer and the SPECTRO XEPOS ED-XRF analyzer.
SPECTRO ARCOS high-resolution ICP-OES analyzer represents the pinnacle of productivity and performance as the first and only spectrometer featuring the fast, convenient selection of axial plasma or radial plasma observation in a single instrument — without any optical compromise. The analyzer delivers dramatically improved sensitivity, stability, and precision — at lower operating costs.
SPECTRO XEPOS ED-XRF spectrometer represents a quantum leap in ED-XRF technology, providing breakthrough advances in the multi-elemental analysis of major, minor, and trace element concentrations. New developments in excitation and detection — introduced with the SPECTRO XEPOS analyzer — deliver outstanding sensitivity and detection limits and yield remarkable gains in precision and accuracy.
The software delivers a greatly improved and more intuitive user experience, plus unequaled ease and speed for the rapid retrieval and processing of results with total traceability.
