The GP200 Series Mass Flow Controller is the first fully pressure-insensitive pressure-based mass flow controller (P-MFC) designed specifically for etch and chemical vapor deposition (CVD) processes in semiconductor manufacturing.
The P-MFC operates well in high-vacuum conditions and above atmospheric pressure conditions that are intrinsic to etch and CVD processes. In comparison, conventional discrete P-MFCs can operate under high-vacuum conditions but degrade in performance and control range as the outlet pressures increase. By offering a greater operating range than conventional P-MFCs, the series can improve etch process performance and expand the application scope to include CVD processes.
The unit provides the most precise process gas delivery even when delivering low vapor pressure process gases. It includes several unique design aspects, including: an integrated differential pressure sensor, a laminar flow element, downstream valve architecture, and an ultra-fast, highly repeatable transient response.
As the GP200 Series supports such a broad range of process conditions, it can be used as a drop-in replacement and upgrade for many traditional P-MFCs and thermal MFCs. It reduces the complexity and cost of ownership of the gas delivery system because it eliminates the need for components such as pressure regulators and transducers.
- True differential pressure measurement
- Lower inlet pressure operation
- Cross-talk insensitive
- Matched transient response
- Downstream valve architecture
- Zero leak-by control valve
- High flow rate capability
